The electrical and optical properties of LiAlxB1−x thin films

Hiroshi Kezuka, Makio Akimoto, Yotaro Taguchi, Kokuya Iwamura, Tomomo Masaki
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引用次数: 1

Abstract

The electrical and optical properties of LiAlxB1−x thin films deposited at 350°C by the Sandwich-Type Evaporation Method are measured. These films are metallic with a resistivity of (1–4) × 105 ohm cm at room temperature. In addition, we have developed a unique method. named the Brewster Angle Method (BAM), for obtaining the optical constants of thin films for LiAlxB1−x. In this method reflection coefficients are measured on the surface of thin films at any angle of incidence using a HeNe laser beam. The optical constants are calculated from the Brewster angle, φB, at the minimum value of reflection coefficient |RB|min. For a typical LiAlxB1−x film the optical constants are n = 1.42 − j0.31 and the complex dielectric constants are ϵ = 1.94 − j0.87.

LiAlxB1−x薄膜的电学和光学性质
用夹层蒸发法测定了350℃下沉积的LiAlxB1−x薄膜的电学和光学性能。这些薄膜是金属的,在室温下电阻率为(1-4)× 105欧姆厘米。此外,我们还开发了一种独特的方法。命名为布鲁斯特角法(BAM),用于获得LiAlxB1−x薄膜的光学常数。在该方法中,利用He氖激光束在薄膜表面以任意入射角测量反射系数。光学常数由反射系数|RB|min最小值处的布鲁斯特角φB计算。对于典型的LiAlxB1−x薄膜,其光学常数为n = 1.42−j0.31,复介电常数为ε = 1.94−j0.87。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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