Nanolithography based on an atom pinhole camera for fabrication of metamaterials

Abstract

We have experimentally realized a method of images construction in atom optics, based on the idea of optical pinhole camera. Generation of identical images with maximum resolution has been explored. With the use of an atom pinhole camera we have built on a Si and glass surfaces an array of identical arbitrary-shape atomic nanostructures with the minimum size of an individual nanostructure’s element down to 50 nm. Limitations of the approach for fabrication of metamaterials are discovered.