Application of nano-imprint technology to grating scale for a rotary microencoder

T. Takeshita, Takuma Iwasaki, E. Higurashi, Tatsuya Miyazaki, R. Sawada
{"title":"Application of nano-imprint technology to grating scale for a rotary microencoder","authors":"T. Takeshita, Takuma Iwasaki, E. Higurashi, Tatsuya Miyazaki, R. Sawada","doi":"10.1109/OMN.2013.6659087","DOIUrl":null,"url":null,"abstract":"Using nano-imprint technology we have developed a rotary diffraction grating scale, which is used for micro rotary encoding. The off-center error between the center of the trough-hole for a rotational axis and the center of the high-precision micro-pattern on the periphery of the scale is less than 3 μm because we are able to shape the through-hole and the grating pattern simultaneously. The use of nano-imprinting is epoch-making, in view of the traditionally poor centering precision of grating scale through-holes fabricated using the conventional photolithography coupled with machining of the through-hole.","PeriodicalId":6334,"journal":{"name":"2013 International Conference on Optical MEMS and Nanophotonics (OMN)","volume":"48 1","pages":"117-118"},"PeriodicalIF":0.0000,"publicationDate":"2013-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 International Conference on Optical MEMS and Nanophotonics (OMN)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMN.2013.6659087","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Using nano-imprint technology we have developed a rotary diffraction grating scale, which is used for micro rotary encoding. The off-center error between the center of the trough-hole for a rotational axis and the center of the high-precision micro-pattern on the periphery of the scale is less than 3 μm because we are able to shape the through-hole and the grating pattern simultaneously. The use of nano-imprinting is epoch-making, in view of the traditionally poor centering precision of grating scale through-holes fabricated using the conventional photolithography coupled with machining of the through-hole.
纳米压印技术在旋转式微编码器光栅刻度上的应用
利用纳米压印技术,研制了一种用于微旋转编码的旋转衍射光栅标度。由于可以同时对通孔和光栅图形进行加工,使得轴向的槽孔中心与刻度外围的高精度微图形中心的偏心误差小于3 μm。针对传统光刻工艺加工光栅尺度通孔定心精度差的问题,采用纳米压印技术具有划时代的意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信