Studying the dependence of the properties of titanium coatings on the technological modes of microplasma sputterer UGNP-7/2250

Abstract

The results of optimizing the technological modes of deposition of titanium coatings by the microplasma method are presented in order to identify the most productive one. Variable values of the current strength of the electric arc, the flow rates of the plasma-forming and transporting gases were used as variable parameters. The sputtering material was PTOM-1 grade titanium powder of various fractional compositions: 20–32, 32–40, and 40–71 µm. A series of experiments was carried out on a combination of a number of factors. The following factors were considered: a coating thickness of at least 200 μm, the exclusion of sintering of the sprayed powder in the channels of the plasma torch, low porosity of the coating (no more than 5%), a tight fit of the coating to the substrate, and the exclusion of delamination of the coating during mechanical processing. As a result, the most optimal modes of coating deposition were identified. For coatings with the lowest porosity (from 1.0 to 1.9%), when all the above indicators were achieved, the morphology and microhardness were studied. According to the SEM microimages of transverse sections, it was determined that the coatings adhere tightly to the substrate material, there are no areas with delamination of the coating, and the microhardness of the coatings is in the range of 685–744 HV.