MOCVD of high quality YBa2Cu3O7−δ thin films using novel fluorinated and non-fluorinated precursors

Abstract

The first high quality, YBa 2 Cu 3 O 7-5 thin films have been produced by MOCVD using the novel fluorinated and non-fluorinated precursors, [Ba(TDFND) 2 .tetraglyme], [Cu(TDFND) 2 ] and [Y(TMHD) 3 .4- t BuPyNO] 2 and the traditional β-diketonate complexes [Y(TMHD) 3 ] 3 and [Cu(TMHD) 2 ]. The novel precursors are thermally stable and highly volatile. Their low melting points, 90 K and critical current density, J c > 10 6 Acm -2 at 77K. Fluorine content ∼100 ppm has been determined by SIMS.