大口径マルチスロットアンテナによる均一 ECR プラズマの生成

Abstract

A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile of the ion saturation current density is examined as a function of microwave power and pressure. The radial uniformity of the ion saturation current density is within pm3% over 8 inches in diameter for the input microwave power lkW at pressure of 2mTorr. Furthermore, the deposition of a-Si：H films is attempted on glass substrates using mixture SiH4/He. When the microwave power is increased, the thickness of the films increases.