Microstructure and Ablation Behavior of Very Low-Pressure Plasma Sprayed ZrB2-Based Coatings

Di Wang, Xiao-Tao Luo, Chang-jiu Li
{"title":"Microstructure and Ablation Behavior of Very Low-Pressure Plasma Sprayed ZrB2-Based Coatings","authors":"Di Wang, Xiao-Tao Luo, Chang-jiu Li","doi":"10.31399/ASM.CP.ITSC2021P0741","DOIUrl":null,"url":null,"abstract":"\n The effect of deposition pressure on the microstructure and ablation behavior of ZrB2 coatings deposited by very low pressure plasma spraying is investigated. The results show that under a chamber pressure less than 50 kPa, as the spray chamber pressure decreases, the porosity of the coating deposited at the same distance decreases, and the coating prepared under 100 Pa presents the lowest porosity of 1.79 %. Furthermore, among the ZrB2 coatings deposited at 100 Pa, 5 kPa, 10 kPa and 50 kPa, the dense coating deposited at 100 Pa showed the lowest ablation rate of 0.33 μm/s, 0.75±0.08 mg/s.","PeriodicalId":70745,"journal":{"name":"热喷涂技术","volume":"54 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2021-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"热喷涂技术","FirstCategoryId":"1087","ListUrlMain":"https://doi.org/10.31399/ASM.CP.ITSC2021P0741","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The effect of deposition pressure on the microstructure and ablation behavior of ZrB2 coatings deposited by very low pressure plasma spraying is investigated. The results show that under a chamber pressure less than 50 kPa, as the spray chamber pressure decreases, the porosity of the coating deposited at the same distance decreases, and the coating prepared under 100 Pa presents the lowest porosity of 1.79 %. Furthermore, among the ZrB2 coatings deposited at 100 Pa, 5 kPa, 10 kPa and 50 kPa, the dense coating deposited at 100 Pa showed the lowest ablation rate of 0.33 μm/s, 0.75±0.08 mg/s.
极低压等离子喷涂zrb2基涂层的组织与烧蚀行为
研究了沉积压力对极低压等离子喷涂ZrB2涂层组织和烧蚀性能的影响。结果表明:在腔压小于50 kPa的条件下,随着喷涂腔压力的减小,相同距离处沉积涂层的孔隙率减小,在100 Pa条件下制备的涂层孔隙率最低,为1.79%;此外,在100pa、5kpa、10kpa和50kpa下沉积的ZrB2涂层中,在100pa下沉积的致密涂层的烧蚀速率最低,为0.33 μm/s, 0.75±0.08 mg/s。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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