Structural and Optical Characterization of Nitrogen-doped TiO2 Thin Films Deposited by Spray Pyrolysis on Fluorine Doped Tin Oxide (FTO) Coated Glass Slides

C. Ayieko, Robinson Musembi, S. Waita, B. O. Aduda, P. Jain
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引用次数: 35

Abstract

Undoped and nitrogen-doped titanium dioxide (TiO2) thin films of 400 nm thick deposited by spray pyrolysis were structurally and optically characterized. The effect of substrate temperature on the optical properties of the films was also investigated. Structural studies of the films were undertaken by X-ray diffraction (XRD). Energy dispersive X-ray (EDX) spectrum analysis was used to confirm the presence of nitrogen atoms in the film after doping. The optical properties such as refractive index (n), energy band gap (Eg) and Urbach energy (Eu) were determined from spectrophotometric measurements of reflectance and transmittance for both undoped and doped films. The Undoped films had an energy band gap of 3.25 eV while the doped films had band gap of 2.90 eV. The Urbach energy increased from 1.00 eV for undoped films to 1.04 eV for the nitrogen-doped films. The reduction in energy band gap and increase in Urbach energy was attributed to the introduction of nitrogen impurity tail states on either the conduction band or the valence band of the titanium dioxide.
氟掺杂氧化锡(FTO)镀膜玻片喷雾热解沉积氮掺杂TiO2薄膜的结构和光学特性
对喷雾热解制备的400 nm厚的未掺杂和掺氮二氧化钛(TiO2)薄膜进行了结构和光学表征。研究了衬底温度对薄膜光学性能的影响。用x射线衍射(XRD)对薄膜进行了结构研究。利用能量色散x射线(EDX)谱分析证实了掺杂后膜中存在氮原子。通过分光光度法测量未掺杂和掺杂薄膜的反射率和透射率,确定了薄膜的折射率(n)、能带隙(Eg)和乌尔巴赫能(Eu)等光学性质。未掺杂薄膜的带隙为3.25 eV,掺杂薄膜的带隙为2.90 eV。氮掺杂膜的乌尔巴赫能量从未掺杂膜的1.00 eV增加到1.04 eV。能隙的减小和乌尔巴赫能的增加是由于在二氧化钛的导带或价带上引入了氮杂质尾态。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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