Preparation and Study of Cadmium Oxide Doped Gallium Oxide Thin Films and application of Gas Sensor

S. Hamd, A. Ramizy, I. Ibrahim
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Abstract

In this paper, the structure and optical properties of pure cadmium oxide films, and doped with gallium oxide have been achieved, the films were deposited on glass and silicon substrates, with different ratios (1,3,5,7)% via spry pyrolysis method, at the substrate temperature of ̊ C300. XRD results showed that all prepared films had a cubic polycrystalline structure, with preferred orientation of (111) for cadmium oxide. Surface morphology was studied using atomic force microscope (AFM), the grain size of the thin films was about 105.42-69.07 nm, with surface roughness is about (3.32-0.901) nm and root mean square (RMS) (3.97-1.05) nm for cadmium oxide films. The optical properties were studied using UV-VIS spectroscopy at wavelength (300-1100 nm), It was observed that the value of transmittance increases when the gallium doping are increasing and the films have a direct energy gap about (2.3-4) eV that increases with the increase in gallium concentration. Sensitivity properties of pure cadmium oxide films, and doped with gallium oxide was deposed on silicon substrates of NO2 gas at different operation temperatures was found that the films of CdO doped with Gallium oxide on silicon substrate has greater sensitivity than the films than the undoped and that the doping has improved the sensitivity of the membranes CdO.
氧化镉掺杂氧化镓薄膜的制备与研究及气体传感器的应用
本文获得了掺杂氧化镓的纯氧化镉薄膜的结构和光学性质,并通过喷雾热解法在不同比例(1、3、5、7)%的玻璃和硅衬底上沉积了该薄膜,衬底温度为300℃。XRD结果表明,所制备的膜均具有立方多晶结构,对氧化镉的取向优选为(111)。利用原子力显微镜(AFM)对薄膜的表面形貌进行了研究,薄膜的晶粒尺寸约为105.42 ~ 69.07 nm,表面粗糙度约为(3.32 ~ 0.901)nm,均方根(RMS)为(3.97 ~ 1.05)nm。利用紫外可见光谱(UV-VIS)研究了薄膜在300 ~ 1100 nm波段的光学性能,发现薄膜的透过率随镓掺杂量的增加而增加,薄膜的直接能隙约为(2.3 ~ 4)eV,且随镓浓度的增加而增大。研究了纯氧化镉薄膜和掺杂氧化镓的二氧化氮气体在不同操作温度下沉积在硅衬底上的灵敏度,发现在硅衬底上掺杂氧化镓的CdO薄膜比未掺杂的CdO薄膜具有更大的灵敏度,表明掺杂提高了CdO膜的灵敏度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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