Shuxin Song, Yu Wang, Min Liang, Xiaojing Qi, Jinjun Yang, Ye Jin, Tungalag Dong
{"title":"Mechanical and Gas Barrier Properties of Poly(L-Lactic Acid) by Plasma-Enhanced Chemical Vapor Deposition of SiOx","authors":"Shuxin Song, Yu Wang, Min Liang, Xiaojing Qi, Jinjun Yang, Ye Jin, Tungalag Dong","doi":"10.1080/03602559.2017.1329439","DOIUrl":null,"url":null,"abstract":"ABSTRACT In this work, poly(L-lactic acid) film was coated with SiOx by the plasma-enhanced chemical vapor deposition with different deposition times. Compared with the neat poly(L-lactic acid) film, the oxygen (O2), carbon dioxide (CO2), nitrogen (N2), and water vapor permeability of the poly(L-lactic acid)/SiOx60 film (depositing for 60 min) decreased by 40.7, 30.6, 58.7, and 53.4% at 25°C, respectively. After treated by the SiOx deposition, the gas permselectivity of the poly(L-lactic acid)/SiOx60 film, such as α(CO2/O2), α(O2/N2), and α(CO2/N2), increased by 17.2, 43.9, and 67.5% at 25°C, respectively. In addition, Young’s modulus and tensile strength of poly(L-lactic acid)/SiOx60 film increased by 107.2 and 49.3%, respectively. Moreover, the poly(L-lactic acid)/SiOx60 films still kept good toughness with an elongation at break of 50.7%. GRAPHICAL ABSTRACT","PeriodicalId":20629,"journal":{"name":"Polymer-Plastics Technology and Engineering","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2018-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Polymer-Plastics Technology and Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1080/03602559.2017.1329439","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"Materials Science","Score":null,"Total":0}
引用次数: 5
Abstract
ABSTRACT In this work, poly(L-lactic acid) film was coated with SiOx by the plasma-enhanced chemical vapor deposition with different deposition times. Compared with the neat poly(L-lactic acid) film, the oxygen (O2), carbon dioxide (CO2), nitrogen (N2), and water vapor permeability of the poly(L-lactic acid)/SiOx60 film (depositing for 60 min) decreased by 40.7, 30.6, 58.7, and 53.4% at 25°C, respectively. After treated by the SiOx deposition, the gas permselectivity of the poly(L-lactic acid)/SiOx60 film, such as α(CO2/O2), α(O2/N2), and α(CO2/N2), increased by 17.2, 43.9, and 67.5% at 25°C, respectively. In addition, Young’s modulus and tensile strength of poly(L-lactic acid)/SiOx60 film increased by 107.2 and 49.3%, respectively. Moreover, the poly(L-lactic acid)/SiOx60 films still kept good toughness with an elongation at break of 50.7%. GRAPHICAL ABSTRACT