{"title":"HNF - Helmholtz Nano Facility","authors":"Wolfgang Albrecht, J. Moers, B. Hermanns","doi":"10.17815/JLSRF-3-158","DOIUrl":null,"url":null,"abstract":"The Helmholtz Nano Facility (HNF) is a state-of-the-art cleanroom facility. The cleanroom has ~1100 m 2 with cleanroom classes of DIN ISO 1-3. HNF operates according to VDI DIN 2083, Good Manufacturing Practice (GMP) and aquivalent to Semiconductor Industry Association (SIA) standards. HNF is a user facility of Forschungszentrum Julich and comprises a network of facilities, processes and systems for research, production and characterization of micro- and nanostructures. HNF meets the basic supply of micro- and nanostructures for nanoelectronics, fluidics. micromechanics, biology, neutron and energy science, etc.. The task of HNF is rapid progress in nanostructures and their technology, offering efficient access to infrastructure and equipment. HNF gives access to expertise and provides resources in production, synthesis, characterization and integration of structures, devices and circuits. HNF covers the range from basic research to application oriented research facilitating a broad variety of different materials and different sample sizes.","PeriodicalId":16282,"journal":{"name":"Journal of large-scale research facilities JLSRF","volume":"93 1","pages":"112"},"PeriodicalIF":0.0000,"publicationDate":"2017-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"97","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of large-scale research facilities JLSRF","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17815/JLSRF-3-158","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 97
Abstract
The Helmholtz Nano Facility (HNF) is a state-of-the-art cleanroom facility. The cleanroom has ~1100 m 2 with cleanroom classes of DIN ISO 1-3. HNF operates according to VDI DIN 2083, Good Manufacturing Practice (GMP) and aquivalent to Semiconductor Industry Association (SIA) standards. HNF is a user facility of Forschungszentrum Julich and comprises a network of facilities, processes and systems for research, production and characterization of micro- and nanostructures. HNF meets the basic supply of micro- and nanostructures for nanoelectronics, fluidics. micromechanics, biology, neutron and energy science, etc.. The task of HNF is rapid progress in nanostructures and their technology, offering efficient access to infrastructure and equipment. HNF gives access to expertise and provides resources in production, synthesis, characterization and integration of structures, devices and circuits. HNF covers the range from basic research to application oriented research facilitating a broad variety of different materials and different sample sizes.
亥姆霍兹纳米设施(HNF)是最先进的洁净室设施。洁净室面积约1100m2,洁净室等级为DIN ISO 1-3。HNF根据VDI DIN 2083,良好生产规范(GMP)和相当于半导体行业协会(SIA)的标准运营。HNF是Julich Forschungszentrum的用户设施,包括用于研究、生产和表征微纳米结构的设施、工艺和系统网络。HNF满足了纳米电子学、流体学的微纳米结构的基本需求。微力学、生物学、中子与能源科学等。HNF的任务是纳米结构及其技术的快速发展,为基础设施和设备提供有效的访问。HNF为结构、设备和电路的生产、合成、表征和集成提供专业知识和资源。HNF涵盖了从基础研究到应用导向研究的范围,促进了各种不同材料和不同样本量的研究。