Review: Research progress on nanosecond laser irradiation damage of optical films

Yuling Wu , Xia Xiang , Jingxia Yu , Xiaodong Yuan , Huahai Shen , Wanguo Zheng , Xiaotao Zu
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引用次数: 0

Abstract

Nanosecond laser irradiation damage of optical films is one of the main factors to limit the output power when the high power solid laser system is used to drive inertial confinement nuclear fusion. In this review, taking SiO2 and HfO2 antireflection films as examples, the physical mechanisms of nanosecond laser irradiation damage of optical films were summarized from two aspects, i.e., numerical simulation studies and experimental investigations, including thermal melting damage, stress damage and plasma damage during irradiation. Based on the current research and difficulties in the field of irradiation damage of optical films, a brief outlook is given here, which may be helpful to improve the output power and operation stability of laser fusion devices in the future.

综述:纳秒激光辐照损伤光学薄膜的研究进展
采用高功率固体激光系统驱动惯性约束核聚变时,纳秒激光对光学薄膜的辐照损伤是限制输出功率的主要因素之一。本文以SiO2和HfO2增透膜为例,从数值模拟研究和实验研究两方面综述了纳秒激光辐照损伤光学膜的物理机制,包括辐照过程中的热熔损伤、应力损伤和等离子体损伤。针对光学薄膜辐照损伤领域的研究现状和难点,对今后激光聚变装置的输出功率和工作稳定性进行了展望。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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