M. Kishihara, Kaito Fujitani, A. Yamaguchi, Y. Utsumi, I. Ohta
{"title":"Design and Fabrication of PTFE Substrate-Integrated Waveguide Butler Matrix for Short Millimeter Waves","authors":"M. Kishihara, Kaito Fujitani, A. Yamaguchi, Y. Utsumi, I. Ohta","doi":"10.1587/transele.2022ecs6003","DOIUrl":null,"url":null,"abstract":"SUMMARY We attempt to design and fabricate of a 4 × 4 Butler matrix for short-millimeter-wave frequencies by using the microfabrication process for a polytetrafluoroethylene (PTFE) substrate-integrated waveguide (SIW) by the synchrotron radiation (SR) direct etching of PTFE and the addition of a metal film by sputter deposition. First, the dimensions of the PTFE SIW using rectangular through-holes for G-band (140-220 GHz) operation are determined, and a cruciform 90 ◦ hybrid coupler and an inter-section circuit are connected by the PTFE SIW to design the Butler matrix. Then, a trial fabrication is performed. Finally, the validity of the design result and the fabrication process is verified by measuring the radiation pattern. key words: microstructure, X-ray lithography, dielectric loaded waveguides","PeriodicalId":13259,"journal":{"name":"IEICE Trans. Electron.","volume":"64 1","pages":"111-115"},"PeriodicalIF":0.0000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEICE Trans. Electron.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1587/transele.2022ecs6003","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
SUMMARY We attempt to design and fabricate of a 4 × 4 Butler matrix for short-millimeter-wave frequencies by using the microfabrication process for a polytetrafluoroethylene (PTFE) substrate-integrated waveguide (SIW) by the synchrotron radiation (SR) direct etching of PTFE and the addition of a metal film by sputter deposition. First, the dimensions of the PTFE SIW using rectangular through-holes for G-band (140-220 GHz) operation are determined, and a cruciform 90 ◦ hybrid coupler and an inter-section circuit are connected by the PTFE SIW to design the Butler matrix. Then, a trial fabrication is performed. Finally, the validity of the design result and the fabrication process is verified by measuring the radiation pattern. key words: microstructure, X-ray lithography, dielectric loaded waveguides