Comprehensive study of group III-nitride light emitting diode structures based on sapphire and ScAlMgO4 (0001) substrate for high intensity green emission

F. Z. Tithy, S. Hussain
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引用次数: 1

Abstract

To mitigate the green gap problems existing in GaN/InGaN/AlGaN system on sapphire substrate, an In0.17Ga0.83N/InxGa1–xN/AlyGa1–yN based LED structure on ScAlMgO4 (0001) substrate has been introduced for green light (525…565 nm) emission. On ScAlMgO4 (0001) substrate, 35% of In composition with 1.6 nm well thickness and only 15% of Al composition with 1.1 nm thick AlGaN as capping layer on top provide the best LED structure. It provides minimum equivalent lattice mismatch (0.01%) with reasonable overall elastic energy value (0.47 J/m2). Most importantly, it provides at least 10% brighter green light emission than that of sapphire based LED structure.
基于蓝宝石和ScAlMgO4(0001)衬底的高强度绿色发光iii族氮化发光二极管结构的综合研究
为了解决蓝宝石衬底GaN/InGaN/AlGaN系统存在的绿隙问题,在ScAlMgO4(0001)衬底上引入了一种基于In0.17Ga0.83N/ InxGa1-xN / AlyGa1-yN的LED结构,用于发出绿光(525…565 nm)。在ScAlMgO4(0001)衬底上,35%的In成分(1.6 nm孔厚度)和15%的Al成分(1.1 nm厚的AlGaN作为封盖层)提供了最佳的LED结构。它提供最小的等效晶格失配(0.01%)和合理的总弹性能值(0.47 J/m2)。最重要的是,它比蓝宝石基LED结构提供至少10%的绿光发射。
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