Wide bandgap semiconductors for ultra high voltage devices. Design and characterization aspects

D. Planson, P. Brosselard, K. Isoird, M. Lazar, L. Phung, C. Raynaud, D. Tournier
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引用次数: 8

Abstract

The development of high voltage devices is a great challenge. At least, railway and smart grids are examples of applications requiring high voltage devices. SiC power devices and technology seem to be mature enough to give a short term solution. Indeed, silicon carbide devices appear to be the semiconductor of choice for high voltage (> 6.5 kV) applications compared to Gallium Nitride. Diamond also is considered as a promising material for the next generation power devices. For high voltage devices, periphery protection is mandatory in order to reduce the well-known electric field crowding taking place at the junction edge. Some details are given about the different periphery technics (JTE, guard rings, MESA) applied to SiC and diamond devices, before combining some of them to reach higher and higher breakdown voltages. Finally, a new setup is under development in order to extract the ionization coefficients, compulsory to predict the breakdown voltage.
超高压器件用宽带隙半导体。设计和特性方面
高压器件的发展是一个巨大的挑战。至少,铁路和智能电网是需要高压设备的应用的例子。SiC功率器件和技术似乎足够成熟,可以提供短期解决方案。事实上,与氮化镓相比,碳化硅器件似乎是高压(> 6.5 kV)应用的半导体选择。金刚石也被认为是下一代动力器件的有前途的材料。对于高压器件,外围保护是强制性的,以减少众所周知的电场拥挤发生在结边。详细介绍了应用于SiC和金刚石器件的不同外围技术(JTE、保护环、MESA),然后将其中一些技术结合起来以达到越来越高的击穿电压。最后,一个新的装置正在开发中,以提取电离系数,强制预测击穿电压。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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