Non-contact measurement of MOSFET with zero bias voltage using the laser-THz emission microscope

M. Yamashita, T. Kiwa, M. Tonouchi, K. Nikawa, C. Otani, K. Kawase
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引用次数: 4

Abstract

For inspecting electrical failures in large-scale integration (LSI) circuits, we developed the laser-THz emission microscope (LTEM), which records the map of THz emission amplitude in a sample upon excitation with fs laser pulses. We successfully observed the THz emission image of MOSFETs embedded in a test element group under zero bias voltage. This result suggests that the LTEM can be used not only for the defect localization in LSI failure analysis but also as in-line inspection and monitoring.
用激光太赫兹发射显微镜非接触测量零偏置电压的MOSFET
为了检测大规模集成电路(LSI)的电气故障,我们研制了激光太赫兹发射显微镜(LTEM),该显微镜记录了样品在激光脉冲激励下的太赫兹发射幅值图。我们成功地观察了零偏置电压下嵌入在测试元件组中的mosfet的太赫兹发射图像。这一结果表明,LTEM不仅可以用于大规模集成电路失效分析中的缺陷定位,还可以用于在线检测和监控。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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