Synthesis and Characterizations of Nanodiamond and its Application as Anti-Polishing Agent on SiO2 Substrate

Abstract

In current study nanodiamond particles were synthesized, purified and characterized. Then the nanodiamond surface was firstly oxidized to establish a homogeneous layer of COOH groups. Finally, the functionalized particles were deposited on the SiO2 substrate and its anti-polishing behavior was investigated. The resulting products in this research were characterized by FT-TR, TGA, TEM and SEM.