Y. Tur, E. Lusakowska, G. Luka, P. Potera, I. Virt
{"title":"Lead chalcogenide films grown by pulsed laser deposition","authors":"Y. Tur, E. Lusakowska, G. Luka, P. Potera, I. Virt","doi":"10.1109/NAP.2017.8190232","DOIUrl":null,"url":null,"abstract":"Three lead chalcogenide films, PbTe, PbSe, and PbS, with a high structural quality were grown by pulsed lased deposition. The films were grown on single crystal substrates (Si, KCl, Al<inf>2</inf>O<inf>3</inf>) and on Si covered with a Si<inf>3</inf>N<inf>4</inf> buffer layer. The Si<inf>3</inf>N<inf>4</inf> layer latter facilitated the lead chalcogenide layer nucleation during the first growth stages and resulted in a more homogeneous surface morphology and a lower surface roughness. The surface geometry (roughness) of the films grown on Si<inf>3</inf>N<inf>4</inf> was studied by means of the power spectral density analysis.","PeriodicalId":6516,"journal":{"name":"2017 IEEE 7th International Conference Nanomaterials: Application & Properties (NAP)","volume":"139 1","pages":"03NE01-1-03NE01-3"},"PeriodicalIF":0.0000,"publicationDate":"2017-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 IEEE 7th International Conference Nanomaterials: Application & Properties (NAP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NAP.2017.8190232","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Three lead chalcogenide films, PbTe, PbSe, and PbS, with a high structural quality were grown by pulsed lased deposition. The films were grown on single crystal substrates (Si, KCl, Al2O3) and on Si covered with a Si3N4 buffer layer. The Si3N4 layer latter facilitated the lead chalcogenide layer nucleation during the first growth stages and resulted in a more homogeneous surface morphology and a lower surface roughness. The surface geometry (roughness) of the films grown on Si3N4 was studied by means of the power spectral density analysis.