Measuring In-Thickness Mechanical Properties of Sub Micron Polymer Dielectric Films

M. van Soestbergen, L. Ernst, K. Jansen, W. V. van Driel, M. Bartek, A. Polyakov
{"title":"Measuring In-Thickness Mechanical Properties of Sub Micron Polymer Dielectric Films","authors":"M. van Soestbergen, L. Ernst, K. Jansen, W. V. van Driel, M. Bartek, A. Polyakov","doi":"10.1109/ESIME.2006.1644030","DOIUrl":null,"url":null,"abstract":"The ongoing miniaturization of microelectronics has led to low-K polymer dielectric films with a thickness of several tens of nanometers. These thin polymer films generally show time dependent material properties, that are different in lateral directions and in-thickness direction. Most techniques available for measuring the mechanical properties of thin films are only capable of obtaining the in-plane modulus. To have an in-situ measurement of the in-thickness viscoelastic modulus, a parallel plate capacitor under hydrostatic pressure is used. An interdigitated electrode is used to capture the change in dielectric constant under pressure. As a first estimation, a BCB (benzocyclobutene) film was used. The in-thickness elastic modulus and change in permittivity for a 1.3 mum thick BCB (Cyclotenetrade 4022) film sandwiched between two alumina electrodes on a silicon wafer are reported to be 4.76plusmn0.42, 3.81plusmn0.26 and 3.16plusmn0.15 GPa for 20deg;, 50 deg; and 70deg; C respectively","PeriodicalId":60796,"journal":{"name":"微纳电子与智能制造","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2006-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"微纳电子与智能制造","FirstCategoryId":"1087","ListUrlMain":"https://doi.org/10.1109/ESIME.2006.1644030","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

The ongoing miniaturization of microelectronics has led to low-K polymer dielectric films with a thickness of several tens of nanometers. These thin polymer films generally show time dependent material properties, that are different in lateral directions and in-thickness direction. Most techniques available for measuring the mechanical properties of thin films are only capable of obtaining the in-plane modulus. To have an in-situ measurement of the in-thickness viscoelastic modulus, a parallel plate capacitor under hydrostatic pressure is used. An interdigitated electrode is used to capture the change in dielectric constant under pressure. As a first estimation, a BCB (benzocyclobutene) film was used. The in-thickness elastic modulus and change in permittivity for a 1.3 mum thick BCB (Cyclotenetrade 4022) film sandwiched between two alumina electrodes on a silicon wafer are reported to be 4.76plusmn0.42, 3.81plusmn0.26 and 3.16plusmn0.15 GPa for 20deg;, 50 deg; and 70deg; C respectively
亚微米聚合物介电薄膜厚度机械性能的测量
微电子技术的不断小型化导致了厚度为几十纳米的低钾聚合物介电膜的出现。这些聚合物薄膜通常表现出随时间变化的材料特性,这些特性在横向和厚度方向上是不同的。大多数用于测量薄膜力学性能的技术只能获得面内模量。为了在现场测量厚度内粘弹性模量,采用了静水压力下的平行板电容器。用交叉指状电极捕捉压力下介电常数的变化。作为初步估计,使用了BCB(苯并环丁烯)薄膜。在硅片上,夹在两个氧化铝电极之间的1.3 μ m厚BCB (Cyclotenetrade 4022)薄膜在20°、50°、20°时的厚度弹性模量和介电常数变化分别为4.76plusmn0.42、3.81plusmn0.26和3.16plusmn0.15 GPa。和70度;C分别
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