G. Dennler, A. Houdayer, P. Raynaud, I. Séguy, Y. Segui, M. Wertheimer
{"title":"Growth Modes of SiOx Films Deposited by Evaporation and Plasma-Enhanced Chemical Vapor Deposition on Polymeric Substrates","authors":"G. Dennler, A. Houdayer, P. Raynaud, I. Séguy, Y. Segui, M. Wertheimer","doi":"10.1023/A:1022865825205","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"25 1","pages":"43-59"},"PeriodicalIF":0.0000,"publicationDate":"2003-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"43","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasmas and Polymers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1023/A:1022865825205","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}