C60 DECOMPOSITION ON SOME TRANSITION METAL AND SEMICONDUCTOR SURFACES

N. Gall’, E. Rut'kov, A. Tontegode
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引用次数: 2

Abstract

A deep understanding of fullerene-surface interaction regularities is a key to widespread fullerene use. We have studied C60 molecular adsorption, thermal transformation and initial film growth stages on four transition metals: W, Mo, Re and Ir in the wide temperature range 300–2000K. Experiments were performed in ultra-high vacuum (UHV) at P < 10−9 Torr by high resolution Auger electron spectroscopy, atomic force microscopy and thermal desorption mass-spectrometry using an absolutely calibrated flux of the depositing C60 molecules.
C60在一些过渡金属和半导体表面的分解
深入了解富勒烯-表面相互作用规律是富勒烯广泛应用的关键。在300-2000K的宽温度范围内,研究了C60在W、Mo、Re和Ir四种过渡金属上的分子吸附、热转化和初始膜生长阶段。实验在P < 10−9 Torr的超高真空(UHV)下进行,采用高分辨率俄歇电子能谱、原子力显微镜和热解吸质谱,使用绝对校准的沉积C60分子通量。
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