M. Ostapenko, V. Semin, A. A. Neiman, F. D’yachenko, L. Meisner
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引用次数: 0
Abstract
TiNi shape memory alloys exhibiting martensitic transformations are attractive materials in the industry of micromechanical systems. The key issue responsible for degradation of functional properties of TiNi during operation is residual stresses arising from the sample processing and surface treatments. In this work, we investigated TiNi substrates modified after synthesis of Ti – Ni – Ta – Si surface alloys (SA) by additive thin film electron-beam (ATF-EB) method. The effect of electron-beam treatments of the system “[Ti – Ni – Ta – Si]SA/TiNi substrate” at the energy density (ES = 1.7 J/cm2) and pulse number n = 10 on the elastic-stress state of the B2 phase in TiNi substrate has been studied. Detailed analysis by X-ray diffraction (XRD) and transmission electron microscopy (TEM) has shown the formation of two isostructured B2 phases with different lattice parameters, chemical composition, and microstructure. It has been found that changes in the B2 lattice parameters are closely related to the variation of the chemical composition and residual elastic stresses of the first kind. The study of residual stresses in the samples reveals that compression stresses in the direction perpendicular to the irradiated surface reach a value of –350 MPa. After additional electron-beam treatment, the compression stress value decreases to –270 MPa.
电子束处理对“表面Ti - Ni- Ta - Si合金/Ti -基体”体系中残余应力水平和演变的影响
以马氏体相变为特征的TiNi形状记忆合金是微机械系统中极具吸引力的材料。在操作过程中,导致TiNi功能性能退化的关键问题是样品加工和表面处理产生的残余应力。本文研究了用薄膜电子束(ATF-EB)法合成Ti - Ni - Ta - Si表面合金(SA)后对TiNi衬底进行改性的方法。研究了能量密度(ES = 1.7 J/cm2)、脉冲数n = 10的“[Ti - Ni - Ta - Si]SA/TiNi衬底”体系电子束处理对TiNi衬底中B2相弹性应力态的影响。通过x射线衍射(XRD)和透射电子显微镜(TEM)的详细分析表明,形成了两种具有不同晶格参数、化学成分和微观结构的等结构B2相。研究发现,B2晶格参数的变化与化学成分和第一类残余弹性应力的变化密切相关。样品残余应力的研究表明,垂直于辐照表面方向的压缩应力达到-350 MPa。经过额外的电子束处理后,压缩应力值降至-270 MPa。