Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon

Abstract

Toshihiro Tabuchi, Yasumasa Toyoshima, Shinichi Fujimoto, and Masayuki Takashiri 1Development Division, Komatsu Ltd., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan 2KELK Ltd., 3-25-1 Shinomiya, Hiratsuka, Kanagawa 254-8543 Japan 3Department of Materials Science, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan * Corresponding authors: e-mail: toshihiro_tabuchi@komatsu.co.jp, and/or takashiri@tokai-u.jp