Tin Selenide Thin Films Deposited by Ultrasonic Spray Pyrolysis for Photovoltaic Applications

J. Narro-Rios, D. Martinez-Escobar, A. Sanchez-Juarez
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Abstract

Tin Selenide films were deposited by ultrasonic spray pyrolysis (USP) technique onto glass substrates. 1, 1-dimethyl-2- Selenourea and SnCl2 were used as precursors of Se and Sn respectively. The X-ray technique shows that the deposited film is of a crystalline nature, identifying the SnSe compound, SnSe2 and SnO2 crystals. The obtained thin films were annealed at 300°C in an H2 atmosphere for 30 minutes to improve the purity of SnSe material. The XRD of the annealed films shows almost no signs of SnSe2 crystals. The measured value of the energy band gap (Eg) of the deposited SnSe films decreases after annealing treatment, from 1.23 eV to 1.09 eV. Seebeck effect showed p-type electrical conductivity in both films and Hall effect show almost no changes in the density of carrier charges and conductivity after annealing the samples. The fabricated devices show the photovoltaic effect with different values depending on the materials used.
超声喷雾热解法制备硒化锡光伏薄膜
采用超声喷雾热解(USP)技术在玻璃基板上沉积硒化锡薄膜。以1,1 -二甲基-2-脲硒和SnCl2分别作为硒和锡的前驱体。x射线技术表明,沉积膜具有结晶性质,鉴定出SnSe化合物、SnSe2和SnO2晶体。所得薄膜在300℃的H2气氛中退火30分钟,以提高SnSe材料的纯度。退火膜的XRD几乎没有发现SnSe2晶体的迹象。经过退火处理后,沉积的SnSe薄膜的能带隙(Eg)测量值从1.23 eV减小到1.09 eV。Seebeck效应在两种薄膜中均表现为p型电导率,而Hall效应在两种薄膜退火后载流子电荷密度和电导率几乎没有变化。所制备器件的光电效应随材料的不同而不同。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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