{"title":"A Surface-Potential Model for N-Polar GaN/AlN/AlGaN MIS-HEMTs","authors":"M. Anuja Menokey, A. Ajoy","doi":"10.1109/icee44586.2018.8937953","DOIUrl":null,"url":null,"abstract":"In this paper, we introduce an analytical surface potential based model for sheet carrier density and current in N-polar GaN/AlN/AlGaN metal insulator semiconductor high electron mobility transistors (MIS-HEMTs). The proposed sheet carrier density model is derived in terms of Fermi-level $(E_{f})$, gate potential $(V_{g})$ and channel potential $(V_{c})$. The surface potential current model using charge control equations and high field saturation Canali mobility model are in close agreement with simulation and experimental data over a wide range of applied gate biases.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"3 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/icee44586.2018.8937953","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper, we introduce an analytical surface potential based model for sheet carrier density and current in N-polar GaN/AlN/AlGaN metal insulator semiconductor high electron mobility transistors (MIS-HEMTs). The proposed sheet carrier density model is derived in terms of Fermi-level $(E_{f})$, gate potential $(V_{g})$ and channel potential $(V_{c})$. The surface potential current model using charge control equations and high field saturation Canali mobility model are in close agreement with simulation and experimental data over a wide range of applied gate biases.