Molecular patterning with a two-dimensional network polymer LB film 2: Drawing patterns by an electron beam

Abstract

Electron beam lithography was investigated using a cross-linkable polymer Langmuir–Blodgett (LB) film. Cross-linking reaction occurs in the LB film with electron beam irradiation as well as UV light irradiation and the irradiated LB film becomes insoluble in the organic solvents to form a two-dimensional network in the LB film. The sensitivity and contrast of the cross-linkable polymer LB film are 3 μC cm^-2 and 0.64, respectively. The limiting resolution of patterning is 0.2 μm line-and-space. The electron beam lithography using the cross-linkable polymer LB film is applicable to the future nanotechnology.