D. Sadana, Ning Li, S. Bedell, Ghavam S Shahidi
{"title":"“Smart Dust” & Internet of Things (IoT): Progress & Challenges","authors":"D. Sadana, Ning Li, S. Bedell, Ghavam S Shahidi","doi":"10.4172/2469-410X.1000160","DOIUrl":null,"url":null,"abstract":"Copyright: © 2017 Sadana DK, et al. This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited. The breath taking progress in CMOS scaling over last five decades has made it possible to shrink complex digital integrated circuits (ICs), such as a microprocessor into dimensions that are approaching a dust particle (<1 mm). For example, the latest 10 nm CMOS product is expected to have ~ 100 million transistors/mm2 (1). This makes fabrication of highly advanced smart dust equipped with a low-power (μW) micro-processor a reality and at a cost of less than a dime! Such unimaginable cost reduction is achievable because a 300 mm Si wafer can easily accommodate over 100,000 advanced ICs on a foot print of <0.8 mm × 0. 8 mm. This allows the recent emergence of Internet of Things (IoT) to be expanded using the “smart dust”. Continued proliferation of IoT is expected to exploit advances in smart dust and low-power wireless communication technologies in conjunction with progress in data security. The impact of IoT in monitoring and controlling various environments, such as agricultural fields, medical, healthcare, manufacturing plants, transportation systems and sending continuous streams of accurate and real-time data can be truly transformational (Figures 1 and 2).","PeriodicalId":92245,"journal":{"name":"Journal of lasers, optics & photonics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2017-06-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of lasers, optics & photonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.4172/2469-410X.1000160","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
“智能粉尘”与物联网(IoT):进展与挑战
版权所有:©2017 Sadana DK, et al。这是一篇根据知识共享署名许可协议发布的开放获取文章,该协议允许在任何媒体上不受限制地使用、分发和复制,前提是要注明原作者和来源。在过去的五十年里,CMOS缩放技术取得了惊人的进展,这使得将复杂的数字集成电路(ic)(如微处理器)缩小到接近尘埃颗粒(<1毫米)的尺寸成为可能。例如,最新的10nm CMOS产品预计将拥有约1亿个晶体管/mm2(1),这使得制造配备低功耗(μW)微处理器的高级智能粉尘成为现实,而且成本不到10美分!这种难以想象的成本降低是可以实现的,因为300mm硅晶圆可以在<0.8 mm × 0的占地面积上轻松容纳超过100,000个先进的ic。8毫米。这使得最近出现的物联网(IoT)可以使用“智能灰尘”进行扩展。物联网的持续扩散,预计将利用智能灰尘和低功耗无线通信技术的进步,以及数据安全的进步。物联网在监测和控制各种环境方面的影响,如农业领域、医疗、保健、制造工厂、运输系统,以及发送连续的准确实时数据流,可以真正具有变革性(图1和2)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。