Laser interference and nanospheres UV lithography to produce micro and nanostructured TiO2 and TiN based sol-gel layers

Y. Jourlin, N. Crespo-Monteiro, V. Vallejo Otero, M. Traynar, M. U. Usuga Higuita, E. Gamet
{"title":"Laser interference and nanospheres UV lithography to produce micro and nanostructured TiO2 and TiN based sol-gel layers","authors":"Y. Jourlin, N. Crespo-Monteiro, V. Vallejo Otero, M. Traynar, M. U. Usuga Higuita, E. Gamet","doi":"10.1117/12.2635170","DOIUrl":null,"url":null,"abstract":"In this paper, a direct and cost-effective sol-gel method to produce stable titanium dioxide and titanium oxynitride photoresists is described. This approach is compatible with many photolithographic techniques. We show that laser interference lithography and nanosphere lithography can be used, respectively, to obtain homogeneous TiO2 diffraction gratings and periodic nanopillars over large areas. Further developments permit to transform TiO2 microstructured based sol-gel to TiN metallic microstructured layer, with good optical properties, by using an innovative rapid thermal nitridation process, which opens the way towards plasmonics and NIR filters based on periodic metallic microstructured layers. Further technological processes were conducted to produce micro and nanostructured TiO2 and TiN layers from a NanoImprint approach. This work demonstrates the versatility of this complete process of soft chemistry new process of patterning TiO2 and TiN thin films avoiding expensive processes (etching, lift-off…) while preserving their diffractive properties and a high thermal stability, up to 1000°C. It is thus compatible to various types of substrates (of different shape and size). These results open up the opportunity to develop a cost-effective and low time-consuming approach to address different fields of cutting-edge applications (metasurfaces, sensors, luxury and decorative industry…).","PeriodicalId":13820,"journal":{"name":"International Conference on Nanoscience, Engineering and Technology (ICONSET 2011)","volume":"28 1","pages":"1220107 - 1220107-10"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Nanoscience, Engineering and Technology (ICONSET 2011)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2635170","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

In this paper, a direct and cost-effective sol-gel method to produce stable titanium dioxide and titanium oxynitride photoresists is described. This approach is compatible with many photolithographic techniques. We show that laser interference lithography and nanosphere lithography can be used, respectively, to obtain homogeneous TiO2 diffraction gratings and periodic nanopillars over large areas. Further developments permit to transform TiO2 microstructured based sol-gel to TiN metallic microstructured layer, with good optical properties, by using an innovative rapid thermal nitridation process, which opens the way towards plasmonics and NIR filters based on periodic metallic microstructured layers. Further technological processes were conducted to produce micro and nanostructured TiO2 and TiN layers from a NanoImprint approach. This work demonstrates the versatility of this complete process of soft chemistry new process of patterning TiO2 and TiN thin films avoiding expensive processes (etching, lift-off…) while preserving their diffractive properties and a high thermal stability, up to 1000°C. It is thus compatible to various types of substrates (of different shape and size). These results open up the opportunity to develop a cost-effective and low time-consuming approach to address different fields of cutting-edge applications (metasurfaces, sensors, luxury and decorative industry…).
激光干涉和纳米球UV光刻技术制备微纳米结构TiO2和TiN基溶胶-凝胶层
本文介绍了一种直接、经济的溶胶-凝胶法制备稳定的二氧化钛和氮化钛光刻胶的方法。这种方法与许多光刻技术兼容。我们证明了激光干涉光刻和纳米球光刻可以分别获得均匀的TiO2衍射光栅和大面积的周期性纳米柱。进一步的发展允许通过使用创新的快速热氮化工艺将TiO2微结构基溶胶凝胶转化为具有良好光学性能的TiN金属微结构层,这为基于周期性金属微结构层的等离子体和近红外滤波器开辟了道路。采用纳米压印方法进一步制备了微纳米结构的TiO2和TiN层。这项工作证明了这种完整的软化学过程的多功能性,该过程避免了昂贵的过程(蚀刻,剥离…),同时保持了它们的衍射特性和高达1000°C的高热稳定性。因此,它与各种类型的基材(不同形状和尺寸)兼容。这些结果为开发具有成本效益和低耗时的方法提供了机会,以解决不同领域的尖端应用(超表面,传感器,奢侈品和装饰行业……)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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