THz time-domain spectroscopy of nanometric-thick gold layers

F. Garet, L. Duvillaret, J. Coutaz
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引用次数: 13

Abstract

Using THz time-domain spectroscopy (THz TDS), we study the far infrared (0.1-1.8 THz) response of evaporated gold films whose thicknesses spread from 1.5 up to 30 nm. In this frequency domain, free carriers mainly dictate the optical properties of metallic materials. These ultra thin films are composed of islands that are in contact when the thickness is larger than a critical value, namely the percolation threshold, leading to a metallic response for those thicknesses. Well below this threshold, the islands are completely separated and no electric conduction is allowed: the films behave as dielectric layers. Around the critical thickness, percolation-type conductivity is observed. THz TDS permits to clearly observe these 3 regimes and to determine the complex refractive index of ultra thin gold layers in the far infrared.
纳米厚金层的太赫兹时域光谱
利用太赫兹时域光谱(THz TDS)研究了厚度为1.5 ~ 30 nm的蒸发金薄膜的远红外(0.1 ~ 1.8 THz)响应。在这个频域,自由载流子主要决定了金属材料的光学性质。这些超薄薄膜由岛屿组成,当厚度大于临界值(即渗透阈值)时,岛屿就会接触,从而导致这些厚度的金属响应。远低于这个阈值,岛屿完全分开,不允许导电:薄膜表现为介电层。在临界厚度附近,观察到渗透型电导率。太赫兹TDS可以清晰地观察这三种状态,并确定超薄金层的远红外复折射率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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