A 1-Tb Density 4b/Cell 3D-NAND Flash on 176-Tier Technology with 4-Independent Planes for Read using CMOS-Under-the-Array

Ted Pekny, Luyen Vu, Jeff Tsai, Dheeraj Srinivasan, E. Yu, J. Pabustan, Joe Xu, Srinivasarao Deshmukh, Kim-Fung Chan, Michael Piccardi, K. Xu, Guan Wang, K. Shakeri, Vipul Patel, T. Iwasaki, Tongji Wang, Padma Musunuri, Carl Gu, A. Mohammadzadeh, Ali Ghalam, V. Moschiano, T. Vali, Jae-Kwan Park, June Lee, R. Ghodsi
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引用次数: 15

Abstract

This paper presents a1Tb 4b/cell 3D-NAND-Flash memory on a 176-tier technology with a 14.7Gb/mm2 bit density. The die is organized using a 4-plane architecture for multiplane operations with a 16KB page size. The 1×4 plane architecture improves both program and read throughput, without increasing the die size. Periphery circuitry and page buffers are placed under the array using 5th-generation CMOS under array (CuA) technology. To improve random read performance, a faster read is provided with a read concurrency feature: allowing four independent multiplane page read addresses. The 4b/cell capability is reached using negative voltage for an expanded window in the negative region and a positive SRC bias, both of which aid in extended reliability. The programming operation is based on a 16–16 programming algorithm. The I/O transfer speed is 1600MT/s in ONFl4.2. The 3D-NAND Flash technology has improved significantly in its performance and reliability, enabling a design of a high density of 4b/cell (QLC) device.
基于176层技术的1tb密度4b/Cell 3D-NAND闪存,具有4个独立平面,用于使用CMOS-Under-the-Array进行读取
本文提出了一种基于176层技术的1tb 4b/cell 3d - nand闪存,其比特密度为14.7Gb/mm2。该die使用4平面架构进行多平面操作,页面大小为16KB。1×4平面架构在不增加芯片尺寸的情况下提高了程序和读取吞吐量。外围电路和页面缓冲区采用第五代CMOS阵列下(CuA)技术放置在阵列下。为了提高随机读性能,提供了一个更快的读并发特性:允许四个独立的多平面页面读地址。4b/cell的容量是使用负电压在负区域扩展窗口和正SRC偏置来达到的,这两者都有助于扩展可靠性。编程操作基于16-16编程算法。在ONFl4.2中I/O传输速度为1600MT/s。3D-NAND闪存技术在性能和可靠性方面有了显著提高,可以设计出高密度的4b/cell (QLC)器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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