Detection of electron trapping/detrapping in MoS 2 FET by high time-resolved I-V measurement

K. Taniguchi
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Abstract

For exploring the origin for the interface states in MoS2 FET, the transient response of MOS capacitor to ultra-fast pulsed top gate voltage was studied with high time resolution current measurement system. The difference of time constant originated from trapping and detrapping of electrons on interface states was detected, which cannot be measured in C-V measurement.
用高时间分辨I-V测量方法检测MoS 2 FET中的电子捕获/去捕获
为了探索MoS2场效应管中界面态的来源,利用高时间分辨率电流测量系统研究了MOS电容对超快脉冲顶栅电压的瞬态响应。由于电子在界面态上的俘获和脱陷导致了时间常数的差异,这在C-V测量中是无法测量的。
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