A study of emerging semi-conductor devices for memory applications

IF 1.2 Q4 NANOSCIENCE & NANOTECHNOLOGY
Shaifali Ruhil, Vandana Khanna, Umesh Dutta, Neeraj Kumar Shukla
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引用次数: 3

Abstract

In this paper, a study of the existing SRAM (Static Random Access Memory) cell topologies using various FET (Field Effect Transistor) low power devices has been done. Various low power based SRAM cells have been reviewed on the basis of different topologies, technology nodes, and techniques implemented. The analysis of MOSFET(Metal Oxide Semiconductor Field Effect Transistor), FinFET( Fin Field Effect Transistor), CNTFET (Carbon Nano Tube Field Effect Transistor), and TFET (Tunnel Field Effect Transistor) based SRAM cells on the basis of parameters such as stability, leakage current, power dissipation, read/write noise margin, access time has been done. HSPICE, TCAD, Synopsys Taurus, and Cadence Virtuoso were some of the software used for simulation. The simulations were done from a few µms to 7nm technology nodes by different authors.
新兴半导体存储器器件的研究
在本文中,研究了现有的SRAM(静态随机存取存储器)单元拓扑结构,使用各种场效应晶体管(FET)低功耗器件。基于不同的拓扑结构、技术节点和实现的技术,对各种低功耗SRAM单元进行了综述。分析了基于SRAM单元的MOSFET(金属氧化物半导体场效应晶体管)、FinFET(翅片场效应晶体管)、CNTFET(碳纳米管场效应晶体管)和TFET(隧道场效应晶体管)的稳定性、漏电流、功耗、读写噪声裕度、访问时间等参数。HSPICE、TCAD、Synopsys Taurus和Cadence Virtuoso是一些用于模拟的软件。不同的作者从几µms到7nm技术节点进行了模拟。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
international journal of nano dimension
international journal of nano dimension NANOSCIENCE & NANOTECHNOLOGY-
CiteScore
2.80
自引率
20.00%
发文量
0
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