Positron Spectroscopy of Boron Carbide Containing Metal Impurity

Chan Liu
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引用次数: 7

Abstract

Boron carbide (B 4.3 C) semiconductors with metal incorporation were prepared by hot pressing mixtures of boron carbide powder (B 4.3 C) and 0.5 ∼ 1 at% metal (Zr or V). The influences of impurity incorporation on the subtle structure and conductivity of B 4.3 C crystals were investigated. Positron lifetime spectrum, x-ray diffraction and Doppler-broadening analyses indicate that appropriate metal introduction can modify the B 4.3 C structure. Especially, noticeable vacancies are introduced into about the B(3) sites at the chain centers. Meanwhile, the B 4.3 C lattice cell contracts a little along the c axis. No distinctive change of the electrical conductivity is found to accompany the structural change.
含金属杂质碳化硼的正电子光谱
采用碳化硼粉末(b4.3 C)和0.5 ~ 1 at%金属(Zr或V)的热压混合制备了掺杂金属的碳化硼(b4.3 C)半导体,研究了掺杂杂质对b4.3 C晶体细微结构和电导率的影响。正电子寿命谱、x射线衍射和多普勒展宽分析表明,适当的金属引入可以改变b4.3 C的结构。特别是在链中心的B(3)位上引入了明显的空位。同时,b4.3 C晶格胞沿C轴略有收缩。没有发现电导率的明显变化伴随着结构的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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