Effect of RF power on structure and optical properties of RF sputtered copper oxide thin films

Abstract

Copper oxide films were fabricated using RF-magnetron sputtering from CuO target in an argon environment at various RF powers. The effect of RF power on structure, morphology and optical properties of the films was studied. As deposited films were Cu4O3. The GIXRD and Raman spectra show the evolution of CuO phase with increasing RF power. The optical band gap decreases from 2.1 to 1.6 eV with increase in RF power.