Experimental and theoretical investigations of structural and thermoelectric properties of gallium doped ZnO thin films

S. Morikawa, Tsukasa Kobayashi, M. Takashiri
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Abstract

We performed experimental and theoretical investigations of structural and thermoelectric properties of Ga-doped ZnO thin films. We prepared the thin films by a RF magnetron sputtering with various argon gas pressures, followed by thermal annealing at 500°C for 60 min in vacuum condition. We evaluated surface morphology and crystallographic properties as the structural properties of the ZnO thin films. To estimate the thermoelectric properties, we performed Hall measurement and the measurements of electrical conductivity, Seebeck coefficient and power factor. For theoretical analysis, we estimated an energy band structure of ZnO by first-principle calculation (ABINIT) based on density function theory with local density approximation, followed by the calculation of transport properties by BoltzTraP code. As a result, we found that the thin films at 2.0 Pa obtained the highest power factor of 0.73 μW/(cm・K2). Even though the transport properties were exhibited certain differences between the experimental results and the theoretical results, we observed the approximate trend of the transport propeties of ZnO.
掺镓ZnO薄膜结构与热电性能的实验与理论研究
我们对掺杂ga的ZnO薄膜的结构和热电性能进行了实验和理论研究。在不同的氩气压力下,采用射频磁控溅射法制备薄膜,然后在500℃真空条件下退火60 min。我们评价了ZnO薄膜的表面形貌和晶体学性质作为其结构性质。为了估计热电性能,我们进行了霍尔测量和电导率、塞贝克系数和功率因数的测量。在理论分析方面,我们利用基于密度函数理论的第一性原理计算(ABINIT)估计了ZnO的能带结构,并采用BoltzTraP编码计算了ZnO的输运性质。结果发现,在2.0 Pa下,薄膜的功率因数最高,为0.73 μW/(cm·K2)。虽然实验结果和理论结果之间存在一定的差异,但我们观察到ZnO的输运性质的近似趋势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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