Ultrafast high power switching diodes

R. Focia, E. Schamiloglu, C. Fleddermann, W. Nunnally, J. Gaudet
{"title":"Ultrafast high power switching diodes","authors":"R. Focia, E. Schamiloglu, C. Fleddermann, W. Nunnally, J. Gaudet","doi":"10.1109/PPC.1995.596804","DOIUrl":null,"url":null,"abstract":"Impressive progress in semiconductor switch technology has been demonstrated at the A.I. Ioffe Physiotechnical Institute in St. Petersburg, Russia. In the moderate voltage (1 kV), moderate current (100 A) regime, the Ioffe group's technology demonstrates switching times of 2 ns or a di/dt of 5/spl times/10/sup 10/ A/s. In the thyristor area, large diameter devices have demonstrated rates of current rise approaching 10/sup 12/ A/s, which is comparable with spark gaps. A three year research project is underway in collaboration with the Ioffe group which seeks to define the physics, assess the technology, and identify the critical parameters that allow for successful development of semiconductor switches capable of operating at the parameters described above. The initial stage of the program studies individual switches produced by the Ioffe group in order to verify their operational parameters. The second stage of the program will study the physics issues important in achieving the operational specifications. The final stage of the program will suggest modifications to the device manufacture process that may yield further improvements in performance. This paper presents information on a computer-controlled test stand that was developed for testing a variety of components produced by the Ioffe group. Information on circuit modeling using PSPICE and one specific test circuit are discussed. Finally, performance results for two kinds of drift step recovery diodes (DSRD) are presented.","PeriodicalId":11163,"journal":{"name":"Digest of Technical Papers. Tenth IEEE International Pulsed Power Conference","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1995-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Technical Papers. Tenth IEEE International Pulsed Power Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PPC.1995.596804","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9

Abstract

Impressive progress in semiconductor switch technology has been demonstrated at the A.I. Ioffe Physiotechnical Institute in St. Petersburg, Russia. In the moderate voltage (1 kV), moderate current (100 A) regime, the Ioffe group's technology demonstrates switching times of 2 ns or a di/dt of 5/spl times/10/sup 10/ A/s. In the thyristor area, large diameter devices have demonstrated rates of current rise approaching 10/sup 12/ A/s, which is comparable with spark gaps. A three year research project is underway in collaboration with the Ioffe group which seeks to define the physics, assess the technology, and identify the critical parameters that allow for successful development of semiconductor switches capable of operating at the parameters described above. The initial stage of the program studies individual switches produced by the Ioffe group in order to verify their operational parameters. The second stage of the program will study the physics issues important in achieving the operational specifications. The final stage of the program will suggest modifications to the device manufacture process that may yield further improvements in performance. This paper presents information on a computer-controlled test stand that was developed for testing a variety of components produced by the Ioffe group. Information on circuit modeling using PSPICE and one specific test circuit are discussed. Finally, performance results for two kinds of drift step recovery diodes (DSRD) are presented.
超快高功率开关二极管
在俄罗斯圣彼得堡的ai Ioffe物理技术研究所,半导体开关技术取得了令人瞩目的进展。在中电压(1kv),中电流(100a)的情况下,Ioffe集团的技术证明开关时间为2ns或di/dt为5/spl次/10/sup 10/ A/s。在晶闸管领域,大直径器件的电流上升率接近10/sup 12/ A/s,这与火花间隙相当。与Ioffe集团合作的一个为期三年的研究项目正在进行中,该项目旨在定义物理,评估技术,并确定允许成功开发能够在上述参数下工作的半导体开关的关键参数。该计划的初始阶段研究Ioffe集团生产的单个开关,以验证其操作参数。该计划的第二阶段将研究在实现操作规范方面重要的物理问题。该计划的最后阶段将建议对设备制造过程进行修改,以进一步提高性能。本文介绍了计算机控制试验台的信息,该试验台是为测试Ioffe集团生产的各种部件而开发的。讨论了使用PSPICE进行电路建模的相关信息和一个具体的测试电路。最后给出了两种漂移阶跃恢复二极管(dsd)的性能结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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