The effect of the chemical activity of the implanted element to metal alloy components on the formation of surface layers under ion irradiation

V. L. Vorobyev, P. Bykov, S. G. Bystrov, A. Kolotov, V. Bayankin
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Abstract

The paper comparatively studies the effect of implanting O+ ions into the Cu50Ni50 and Cu56Mn44 alloys and M0 copper, as well as N+ ions into the VT6 titanium alloy, the 03Kh17N12M2T stainless steel, and Armco iron, on the formation of the chemical composition and changes in the structural and phase state of the surface layers. It is shown that, under conditions of implantation of ions of chemically active elements, the accumulation of the implanted impurity, the formation of chemical compounds, and their precipitation in the form of phase inclusions are determined by the chemical activity of the implanted element to the alloy components. The results obtained will allow the further development of scientific foundations for the formation of the chemical and structural-phase state in materials under nonequilibrium conditions of ion implantation.
离子辐照下注入元素对金属合金成分化学活性对表层形成的影响
对比研究了在Cu50Ni50、Cu56Mn44合金和M0铜中注入O+离子,在VT6钛合金、03Kh17N12M2T不锈钢和Armco铁中注入N+离子,对表层化学成分的形成、组织和相态变化的影响。结果表明,在注入化学活性元素离子的条件下,注入杂质的积累、化合物的形成以及以相夹杂形式析出是由注入元素对合金组分的化学活性决定的。所得结果将为离子注入非平衡条件下材料的化学相和结构相的形成提供进一步的科学基础。
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