Synthesis and Characterization of Ternary BexZn1-xO Nano Thin Films prepared by Pulsed Laser Deposition Technique

A. Abed, M. Hussein
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Abstract

         Beryllium Zinc Oxide (BexZn1-xO) ternary nano thin films were deposited using the pulsed laser deposition (PLD) technique under a vacuum condition of 10-3 torr at room temperature on glass substrates with different films thicknesses, (300, 600 and 900 nm). UV-Vis spectra study found the optical band gap for Be0.2Zn0.8O to be  (3.42, 3.51 and 3.65 eV) for the (300, 600 and 900nm) film thicknesses, respectively which is larger than the value of zinc oxide ZnO (3.36eV) and smaller than that of beryllium oxide BeO (10.6eV). While the X-ray diffraction (XRD) pattern analysis of ZnO, BeO and Be 0.2 Zn 0.8 O powder and nano-thin films indicated a hexagonal polycrystalline wurtzite structure. The crystal structure showed a preferential orientation line at (101). Besides the nano thin film Be0.5Zn0.5O has all orientations of ZnO and BeO. Moreover, the calculated average crystallite size for nano thin film was 16.48 nm.  The surface morphology of the nano thin films investigated by atomic force microscope (AFM) showed a decrease in the average grain sizes (94.8, 79.2 and 59.4 nm) with the increase of films thickness due to quantum confinement effect.
脉冲激光沉积技术制备BexZn1-xO三元纳米薄膜及其表征
采用脉冲激光沉积(PLD)技术,在10-3 torr的真空条件下,在300、600和900 nm的不同薄膜厚度的玻璃衬底上沉积了铍氧化锌(BexZn1-xO)三元纳米薄膜。紫外可见光谱研究发现,Be0.2Zn0.8O在(300、600和900nm)薄膜厚度下的光学带隙分别为(3.42、3.51和3.65 eV),大于氧化锌ZnO (3.36eV),小于氧化铍BeO (10.6eV)。而ZnO、BeO和Be 0.2 Zn 0.8 O粉末及纳米薄膜的x射线衍射(XRD)分析显示为六方多晶纤锌矿结构。晶体结构在(101)处呈现优先取向线。此外,Be0.5Zn0.5O纳米薄膜具有ZnO和BeO的所有取向。计算得到纳米薄膜的平均晶粒尺寸为16.48 nm。原子力显微镜(AFM)观察纳米薄膜的表面形貌发现,由于量子约束效应,随着薄膜厚度的增加,平均晶粒尺寸(94.8 nm、79.2 nm和59.4 nm)减小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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