Conductive glass coating: Effect of atmospheric plasma treatment

A. Roy, A. Mukhopadhyay, Shilabati Hembram, M. Ghosh, A. Majumdar
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Abstract

The application of conductive glass coating in recent years plays a significant role in research and commercial laboratories. We report the change in conducting property of Cu-Ti-Cl thin film coating onto glass substrate as a function of atmospheric pressure plasma (Ar+) treatment (upto 15 minutes). This metal-transition metal chloride coating is prepared by chemical solution process where polyvinyl alcohol (PVA) is used as a chelating agent. The UV-Vis absorption spectra reveal that the optical band gap of the thin film varies from 1.71eV to 2.51eV. A reduction in dc static resistance (2.1MΩ to 0.5MΩ) of the film is obtained from the voltage-current characteristics. The X-ray diffraction peak intensity also reduces with treatment time.The application of conductive glass coating in recent years plays a significant role in research and commercial laboratories. We report the change in conducting property of Cu-Ti-Cl thin film coating onto glass substrate as a function of atmospheric pressure plasma (Ar+) treatment (upto 15 minutes). This metal-transition metal chloride coating is prepared by chemical solution process where polyvinyl alcohol (PVA) is used as a chelating agent. The UV-Vis absorption spectra reveal that the optical band gap of the thin film varies from 1.71eV to 2.51eV. A reduction in dc static resistance (2.1MΩ to 0.5MΩ) of the film is obtained from the voltage-current characteristics. The X-ray diffraction peak intensity also reduces with treatment time.
导电玻璃涂层:大气等离子体处理的效果
近年来,导电玻璃镀膜的应用在研究和商业实验室中发挥着重要作用。我们报道了Cu-Ti-Cl薄膜涂层在玻璃基板上的导电性能随大气压等离子体(Ar+)处理(长达15分钟)的变化。以聚乙烯醇(PVA)为螯合剂,采用化学溶液法制备金属-过渡金属氯化物涂层。紫外可见吸收光谱显示,薄膜的光学带隙在1.71 ~ 2.51eV之间变化。薄膜的直流静态电阻(2.1MΩ至0.5MΩ)的减小是由电压-电流特性得到的。x射线衍射峰强度也随处理时间的延长而减小。近年来,导电玻璃镀膜的应用在研究和商业实验室中发挥着重要作用。我们报道了Cu-Ti-Cl薄膜涂层在玻璃基板上的导电性能随大气压等离子体(Ar+)处理(长达15分钟)的变化。以聚乙烯醇(PVA)为螯合剂,采用化学溶液法制备金属-过渡金属氯化物涂层。紫外可见吸收光谱显示,薄膜的光学带隙在1.71 ~ 2.51eV之间变化。薄膜的直流静态电阻(2.1MΩ至0.5MΩ)的减小是由电压-电流特性得到的。x射线衍射峰强度也随处理时间的延长而减小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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