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Diffusion Model of Aluminium for the Formation of a Deep Junction in Silicon

Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI:10.4313/JKEM.2020.33.4.263
J. Chae
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铝在硅中形成深结的扩散模型
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Journal of The Korean Institute of Electrical and Electronic Material Engineers
Journal of The Korean Institute of Electrical and Electronic Material Engineers
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