Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies

Y. Kim, Ji-Ho Cho, Jong-Sik Kim, Jong-Bae Park, Daechul Kim, Young-Woo Kim
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引用次数: 2

Abstract

In this study, various diagnostic tools were constructed and plasma factors measured to evaluate the intelligence of plasma process equipment. We used an ICP (Inductively Coupled Plasma) reactor with a radio frequency (RF) power of 13.56 MHz, a power of 400 to 800 W, and a pressure of 10 to 30 mTorr. Plasma parameters such as electron density (ne), electron temperature (Te), plasma potential (Vp), and floating potential (Vf) were measured using several instruments (VI probe and mass/energy analyzer, etc.) and subsequently analyzed. Regression analysis was performed to correlate the measured data with the plasma parameters. As a result, the plasma density (ne) and temperature (Te) were observed to be in good agreement with the non-invasive measurement results. In particular, the VI probes were highly correlated with almost all the measured plasma parameters. Therefore, the results of this study provide a basis for the estimation of plasma parameters using non-invasive measurement techniques.
等离子体设备智能化研究综合数据采集装置
在本研究中,构建了各种诊断工具,并测量了血浆因子来评估血浆工艺设备的智能化。我们使用了电感耦合等离子体(ICP)反应堆,射频(RF)功率为13.56 MHz,功率为400至800 W,压力为10至30 mTorr。等离子体参数如电子密度(ne)、电子温度(Te)、等离子体电位(Vp)、漂浮电位(Vf)等通过多种仪器(VI探针、质量/能量分析仪等)测量并分析。对测量数据与等离子体参数进行回归分析。结果表明,等离子体密度(ne)和温度(Te)与无创测量结果吻合较好。特别是,VI探针与几乎所有测量的等离子体参数高度相关。因此,本研究结果为利用无创测量技术估算等离子体参数提供了依据。
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