The effect of addition agents on the electrical resistivity of electrodeposited nickel

P. Sibley , P.A. Brook
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引用次数: 3

Abstract

The effects of butynediol, coumarin, sodium naphthalenesulphonate, sodium benzenesulphonate and toluenesulphonamide on the electrical resistivity, mean grain diameter and hardness of nickel deposited from a Watts type solution are reported. The resistivity is dependent on type of addition, its concentration and the thickness of the deposit. The effect of thickness is that a very flat maximum is produced in between 10 and 20 μm. The absolute values of the resistivity vary from ≈70 μΩ-mm for deposits from a pure Watts bath to ≈120 μΩ-mm for deposits from baths containing coumarin.

The results are correlated with the size and active groups of the molecules through their adsorption-desorption behaviour. The adsorption of butynediol follows the Langmuir adsorption.

添加剂对电沉积镍电阻率的影响
本文报道了丁炔二醇、香豆素、萘磺酸钠、苯磺酸钠和甲苯磺酰胺对瓦特型镀液中镍的电阻率、平均晶粒直径和硬度的影响。电阻率取决于添加物的类型、浓度和矿床的厚度。厚度的影响是在10 ~ 20 μm之间产生一个非常平坦的最大值。电阻率的绝对值从≈70 μΩ-mm(纯瓦氏浴沉积)到≈120 μΩ-mm(含香豆素浴沉积)。结果与分子的大小和活性基团通过它们的吸附-解吸行为相关联。丁炔二醇的吸附遵循Langmuir吸附。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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