Zheng Gao , Yuzun Gao , Yonghong Li , Taisong Zhang , Yi Li
{"title":"Effects of helium ion implantation on the structure of nanophase and coarse-grain titanium films","authors":"Zheng Gao , Yuzun Gao , Yonghong Li , Taisong Zhang , Yi Li","doi":"10.1016/S0965-9773(99)00382-7","DOIUrl":null,"url":null,"abstract":"<div><p><span><span>Nanophase and coarse-grain titanium films were prepared on Mo substrates by Ion Beam Assisted Deposition. </span>Ion implantation<span> of helium was used to simulate the behavior of helium in titanium films. Helium ions (100 keV) were implanted into the titanium films with a dose of 5 × 10</span></span><sup>17</sup>/cm<sup>2</sup><span><span>. The retained helium in the titanium films after implantation was detected by Enhanced Proton Back Scattering (EPBS). The microstructure of titanium films and the distribution of helium bubbles were studied by </span>Transmission Electron Microscopy (TEM). It was found that helium bubbles were formed in the coarse-grain titanium films with a size distribution of 1 to 10 nm and a numerical density of 5 to 25 × 10</span><sup>22</sup>/m<sup>3</sup>. No helium bubble was observed in the nanophase titanium films. A discussion is presented for helium bubble formation.</p></div>","PeriodicalId":18878,"journal":{"name":"Nanostructured Materials","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1999-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/S0965-9773(99)00382-7","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanostructured Materials","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0965977399003827","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
Nanophase and coarse-grain titanium films were prepared on Mo substrates by Ion Beam Assisted Deposition. Ion implantation of helium was used to simulate the behavior of helium in titanium films. Helium ions (100 keV) were implanted into the titanium films with a dose of 5 × 1017/cm2. The retained helium in the titanium films after implantation was detected by Enhanced Proton Back Scattering (EPBS). The microstructure of titanium films and the distribution of helium bubbles were studied by Transmission Electron Microscopy (TEM). It was found that helium bubbles were formed in the coarse-grain titanium films with a size distribution of 1 to 10 nm and a numerical density of 5 to 25 × 1022/m3. No helium bubble was observed in the nanophase titanium films. A discussion is presented for helium bubble formation.
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