High-Quality n-Type Ge/SiGe Multilayers for THz Quantum Cascade Lasers

M. Montanari, C. Ciano, L. Persichetti, L. Gaspare, M. Virgilio, G. Capellini, M. Zoellner, O. Skibitzki, D. Stark, G. Scalari, J. Faist, D. Paul, T. Grange, S. Birner, M. Scuderi, G. Nicotra, O. Moutanabbir, S. Mukherjee, L. Baldassarre, M. Ortolani, M. Seta
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Abstract

The exploitation of intersubband transitions in Ge/SiGe quantum cascade devices could pave the way towards the integration of THz light emitters into the silicon-based technology. Aiming at the realization of a Ge/SiGe Quantum Cascade Laser (QCL), we investigate optical and structural properties of n-type Ge/SiGe coupled quantum well systems. The samples have been investigated by means of X-ray diffraction, scanning transmission electron microscopy, atom probe tomography and Fourier Transform Infrared absorption spectroscopy to assess the growth capability with respect to QCL design requirements, carefully identified by means of modelling based on the non-equilibrium Green function formalism.
用于太赫兹量子级联激光器的高质量n型Ge/SiGe多层材料
利用Ge/SiGe量子级联器件的子带间跃迁可以为将太赫兹光发射器集成到硅基技术中铺平道路。以实现Ge/SiGe量子级联激光器(QCL)为目标,研究了n型Ge/SiGe耦合量子阱系统的光学和结构特性。通过x射线衍射、扫描透射电子显微镜、原子探针断层扫描和傅里叶变换红外吸收光谱对样品进行了研究,以评估与QCL设计要求相关的生长能力,并通过基于非平衡格林函数形式主义的建模仔细识别。
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