Thermophoretic Efficiency in the MCVD Process: A CFD Modeling

Abstract

The thermophoretic efficiency in the modified chemical vapour deposition (MCVD) process has been numerically determined under specified conditions of temperature and velocity field in the silica deposition tube. A CFD code was used to solve a steady-state numerical model of the MCVD process. The cumulative efficiency of $\text{SiO}_{2}$ and $\text{GeO}_{2}$ deposition was calculated along the tube length, yielding to a maximum value of 42% and 37 % respectivelly.