Study on the Generation of the Intermetallic Compound and the Occurrence of the Whiskers Observed in the Double-Layer Plating System (Sn/Cu)

IF 0.5 4区 材料科学 Q4 METALLURGY & METALLURGICAL ENGINEERING
Y. Sakamoto, S. Takemura, Wataru Yamazaki, Masao Shimura, S. Ishihara
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引用次数: 0

Abstract

Many research studies have been conducted so far about the occurrence of the whiskers in Sn-plating. However, most of them have paid attention to the generation mechanism of the whiskers, and to the time variations of both the number and lengths of the whiskers. Very few research studies have been conducted on the correlation between the generation of the intermetallic compound and the occurrence of the whiskers. In the present study, double-layer plating(Sn/Cu thin films)was electrodeposited on the 7-3 brass substrate to investigate quantitatively the time variation of the amount of the intermetallic compound generated in the Sn plating film. It was clarified that the relation between the amount of the intermetallic compound and the elapsed time can be expressed by the two different straight lines on the log-log graph. In the early stage until the first seven days after the plating processing, the rate of the generation amount of the intermetallic compound was faster than that in the next stage. When the amount of the intermetallic compound per area is less than 5% , the whisker density increased with an increase in the amount of the intermetallic compound per area. On the other hand, in more than 5% of domains of the intermetallic compound per area, a clear correlation between them was not observed. It is considered that the internal compressive stresses increase in the inside of the Sn plating with an increase in the amount of the intermetallic compound. It is inferred that the whiskers arise on the Sn-plating film to release the above internal compressive stress. Seven days later after the plating processing, the generation rate of the amount of the intermetallic compound decreased because of the change in the diffusion mechanism, i.e. from the grain boundary diffusion to the volume one. Corresponding to the rate of the amount of the intermetallic compound, the rate of the whiskers formation was also suppressed. [doi:10.2320/jinstmet.J2016055]
Sn/Cu双层镀层中金属间化合物的生成及晶须出现的研究
迄今为止,人们对镀锡过程中晶须的产生进行了大量的研究。然而,大多数研究都关注了晶须的产生机理,以及晶须数量和长度的时间变化。关于金属间化合物的生成与晶须的出现之间的关系的研究很少。本研究在7-3黄铜基底上电镀双层(Sn/Cu薄膜),定量研究镀锡膜中金属间化合物生成量的时间变化。阐明了金属间化合物的量与经过时间的关系可以用对数对数图上两条不同的直线来表示。前期至镀后前7天,金属间化合物生成量的速度比下一阶段快。当单位面积金属间化合物用量小于5%时,晶须密度随单位面积金属间化合物用量的增加而增加。另一方面,在每个区域超过5%的金属间化合物域中,它们之间没有明显的相关性。认为随着金属间化合物含量的增加,镀锡内部的压应力增大。推测镀锡膜上出现晶须是为了释放上述内部压应力。镀后7天,由于扩散机制发生了变化,即从晶界扩散到体积扩散,金属间化合物量的生成速率下降。随着金属间化合物用量的增加,晶须的生成速率也受到抑制。(doi: 10.2320 / jinstmet.J2016055)
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来源期刊
Journal of The Japan Institute of Metals
Journal of The Japan Institute of Metals 工程技术-冶金工程
CiteScore
0.70
自引率
0.00%
发文量
27
审稿时长
6-12 weeks
期刊介绍: Information not localized
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