ADSORPTION OF COPPER IONS ON CHITOSAN-BASED FILMS FOR DETECTION OF H2S GAS POLLUTANT

A. Gamal, A. Ibrahim, A. El-Zomrawy
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Abstract

Sulfide in its form of free hydrogen sulfide is recognized to cause anxiety at its lower level of concentration, but at a higher level, it causes permanent brain damage, fainting, or even death through asphyxiation. In this study, chitosan films were fabricated, and the copper ions were loaded onto them by way of adsorption to be used in the detection of hydrogen sulfide (H2S) gas electrochemically. The results presented an amazing variation in the electrical resistivity and conductivity of the chitosan and copper-loaded chitosan films against time in response to H2S gas adsorption. Also, the results demonstrate a significant increase in the conductivity of the copper-loaded chitosan/H2S film as compared with pure chitosan/H2S. Furthermore, the films were examined after the H2S adsorption process in many ways; resistor-capacitor circuit, electrochemical impedance spectroscopy, X-ray diffraction (XRD), energy-dispersive X-ray (EDX), as well as electron scanning microscopy (SEM). SEM images indicated the successful loading of copper ions onto the chitosan structure.
壳聚糖基膜吸附铜离子检测h2s气体污染物
以游离硫化氢形式存在的硫化物被认为在浓度较低时引起焦虑,但浓度较高时,它会导致永久性脑损伤、昏厥,甚至因窒息而死亡。本研究制备了壳聚糖薄膜,并将铜离子吸附在壳聚糖薄膜上,用于硫化氢气体的电化学检测。结果表明,壳聚糖和载铜壳聚糖膜的电阻率和电导率随时间的变化对H2S气体的吸附有显著的响应。此外,结果表明,与纯壳聚糖/H2S相比,负载铜的壳聚糖/H2S膜的电导率显著提高。此外,在H2S吸附过程后,对膜进行了多种方法的检测;电阻-电容电路,电化学阻抗谱,x射线衍射(XRD),能量色散x射线(EDX),以及电子扫描显微镜(SEM)。扫描电镜图像表明,铜离子成功加载到壳聚糖结构上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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