Характеристики матричного катода из карбида кремния в предпробойных и пробойных условиях

Владимир Александрович Морозов, Н. В. Егоров, В. В. Трофимов, К. А. Никифоров, И. И. Закиров, Вадим Маркович Кац, В.А. Ильин, Александр Сергеевич Иванов
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Abstract

This study assesses promising field electron sources based on silicon carbide monolithic field emission array (FEA). FEA is fabricated on single-crystal wafers of silicon carbide (0001C) 6H-SiC of n-type conductivity using the technology of two-stage reactive ion etching in SF6/O2/Ar atmosphere. To implement conditions close to breakdown, an experimental setup based on high-voltage narrow pulses generating device GKVI-300 was used. A series of nanosecond voltage pulses with amplitudes from 120 to 250 kV was generated. To study the characteristics of the FEA in the pre-breakdown state, the beam of field emitted electrons was separated from the ion torch or cathode plasma, formed in the following breakdown phases, by placing a 50-μm-thick titanium foil under zero potential into the interelectrode gap. Current-voltage characteristics of peak-currents vs. peak-voltages passing through the foil are close to rectilinear in the Fowler-Nordheim coordinates. The current-voltage characteristics plotted for each of the pulses along increasing and decreasing branches show a discrepancy (hysteresis). After the experiments, the silicon carbide cathode FEA was studied in a scanning electron microscope.
穿孔和穿孔条件下碳化硅基质阴极特征
本研究评估了基于碳化硅单片场发射阵列(FEA)的有前途的场电子源。采用SF6/O2/Ar气氛两级反应离子刻蚀技术,在n型电导率的碳化硅(0001C) 6H-SiC单晶片上制备了FEA。为了实现接近击穿的条件,采用了基于高压窄脉冲产生装置GKVI-300的实验装置。产生了一系列纳秒级电压脉冲,其振幅在120 ~ 250 kV之间。为了研究预击穿状态下的FEA特性,在电极间隙中放置一块50 μm厚的零电位钛箔,将场发射电子束从离子炬或阴极等离子体中分离出来。在Fowler-Nordheim坐标系中,峰值电流与通过箔的峰值电压的电流-电压特性接近直线。沿着增加和减少支路绘制的每个脉冲的电流-电压特性显示出差异(滞后)。实验结束后,在扫描电镜下对碳化硅阴极有限元分析进行了研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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