Extreme ultraviolet interferometric lithography with a desk-top system

2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science Pub Date : 2008-05-04 DOI:10.1109/CLEO.2008.4551312

P. Wachulak, M. Marconi, W. Rockward, D. Hill, E. Anderson, C. Menoni, J. Rocca

引用次数: 0

Abstract

We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100 nm feature size.

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极紫外干涉光刻与桌面系统

我们演示了一种振幅分割干涉仪，该干涉仪使用高亮度桌面极紫外(EUV)激光器的照明，可以产生低于100 nm特征尺寸的大面积线、孔和点阵列。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science

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