{"title":"A thermal control unit for microwave measurements of conductivity of a semiconducting material","authors":"K. Oh, C. Ong, B. Tan","doi":"10.1088/0022-3735/22/10/014","DOIUrl":null,"url":null,"abstract":"A simple thermal control unit, together with a transmission microwave bridge have been constructed for the measurement of electrical conductivity at the X-band frequency of a silicon sample in the range 323 to 573 K. The temperature dependence of the conductivity and hence the band gap of Si were obtained. The technique may be used for other semiconducting materials.","PeriodicalId":16791,"journal":{"name":"Journal of Physics E: Scientific Instruments","volume":"9 1","pages":"876-879"},"PeriodicalIF":0.0000,"publicationDate":"1989-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics E: Scientific Instruments","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/0022-3735/22/10/014","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
A simple thermal control unit, together with a transmission microwave bridge have been constructed for the measurement of electrical conductivity at the X-band frequency of a silicon sample in the range 323 to 573 K. The temperature dependence of the conductivity and hence the band gap of Si were obtained. The technique may be used for other semiconducting materials.